書誌事項
- タイトル別名
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- Alignment pattern detection method using diagonal imaging optics for X-ray exposure system.
- シャホウ ケツゾウ コウガクケイ オ モチイタ Xセン ロコウ ソウチヨウ ア
この論文をさがす
抄録
A precision alignment-pattern detection method using diagonal detection optics and twodimensional image processing technique has been developed to improve the alignment accuracy of X-ray exposure systems. This method features (1) consecutive pattern detection in an exposure field, (2) capability of detecting both lateral displacement and proximity gap between a mask and a wafer using the same detection optics, and (3) reduction of detection error caused by variations in the alignment-pattern fabrication process by using broad-spectrum (Xe light) illumination. According to the simulation of expected quantizing errors in image processing, a pixel resolution of 0.18 μm has been selected to attain a detection resolution less than 0.02 μm. The detection accuracy of an experimental apparatus was investigated, checking the expected error due to variations of wafer alignment patterns, resulting in a detection accuracy of ±0.02 μm for the lateral displacement detection and ± 0.06 μm for the gap detection, respectively.
収録刊行物
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- 精密工学会誌
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精密工学会誌 55 (9), 1687-1693, 1989
公益社団法人 精密工学会
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詳細情報 詳細情報について
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- CRID
- 1390001204797314816
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- NII論文ID
- 110001370090
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- NII書誌ID
- AN1003250X
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- ISSN
- 1882675X
- 09120289
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- NDL書誌ID
- 3245245
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可