Development of the Annular Sputter Ion Pump and its Pumping Characteristics

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Other Title
  • 円環配置型スパッタイオンポンプの開発
  • エンカン ハイチガタ スパッタイオンポンプ ノ カイハツ

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Description

A sputter ion pump with the pumping cells assembled in an annular configuration is developed. The pump is characterized by following factors; 1) minimized residual magnetic field intensity at the center of annular configuration about 80 A/m, 2) high effective pumping speed larger than 0.03 m3/s and 3) low ultimate pressure about 4 × 10-9 Pa. The design is suited for pumping the electron beam equipment such as scanning electron microscope, etc.

Journal

  • Shinku

    Shinku 47 (3), 255-257, 2004

    The Vacuum Society of Japan

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