Negative-Ion Production of Gas Material in RF-Plasma Sputter-Type Heavy Negative-Ion Source.
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- TSUJI Hiroshi
- Department of Electronics, Kyoto UniVersity
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- OKAYAMA Yoshio
- Department of Electronics, Kyoto UniVersity
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- TOYOTA Yoshitaka
- Department of Electronics, Kyoto UniVersity
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- GOTOH Yasuhito
- Department of Electronics, Kyoto UniVersity
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- ISHIKAWA Junzo
- Department of Electronics, Kyoto UniVersity
Bibliographic Information
- Other Title
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- 高周波プラズマスパッタ型負重イオン源における気体材料の負イオン生成
- コウシュウハ プラズマ スパッタガタ フジュウ イオンゲン ニ オケル キタイ
Search this article
Journal
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- Shinku
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Shinku 38 (3), 218-220, 1995
The Vacuum Society of Japan
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Keywords
Details 詳細情報について
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- CRID
- 1390282679042002560
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- NII Article ID
- 10001698536
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- NII Book ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL BIB ID
- 3612169
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles