Simulation of the Time Evolution Profiles in Nanoimprint Lithography

DOI Web Site Web Site 被引用文献2件 参考文献3件
  • Tanabe Toshiaki
    Department of Physics and Electronics Engineering, Osaka Prefecture University
  • Nishihata Masaaki
    Department of Physics and Electronics Engineering, Osaka Prefecture University
  • Kawata Hiroyuki
    Department of Physics and Electronics Engineering, Osaka Prefecture University
  • Hirai Yoshihiko
    Department of Physics and Electronics Engineering, Osaka Prefecture University

この論文をさがす

抄録

To study the time dependence of the resist profiles in nanoimprint lithography, numerical simulation has been done by using conventional finite element method, where the resist is assumed as a viscous fluid body over the glass transition temperature. On the other hand, the resist shape is quenched by rapid cooling just after pressing the resist. Time dependent resist profiles are experimentally observed for various pressing times. The resist filling rate into the mold cavity is evaluated and they relatively agree with each other qualitatively. Also, the dependence of the time evolutions on the aspect ratio of the mold groove is simulated and there exist minimum aspect ratio to shorten the process time.

収録刊行物

被引用文献 (2)*注記

もっと見る

参考文献 (3)*注記

もっと見る

キーワード

詳細情報 詳細情報について

問題の指摘

ページトップへ