Techniques for Measuring Rate Constants for Acid Generation from PAG (Photo Acid Generator) during ArF Exposure
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- Seguchi Atsushi
- Litho Tech Japan Corp
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- Kono Yoshiyuki
- Litho Tech Japan Corp
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- Oda Fumihiko
- Ushio Inc., R&D Center
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- Morimoto Yukihiro
- Ushio Inc., R&D Center
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説明
We previously performed in situ FT-IR measurements while subjecting chemically-amplified resists to UV light (248 nm) to observe photodecomposition of the PAG for KrF excimer lasers. Based on these observations, we measured rate constants for acid generation associated with PAG photodecomposition. More recently, we equipped our FT-IR system with a 193-nm excimer lamp (developed by Ushio Inc.) to perform the world's first in situ observations of PAG photodecomposition using 193-nm light. Our report also describes the successful measurement of rate constants for acid generation from the PAG for ArF excimer lasers.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 21 (1), 69-73, 2008
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詳細情報 詳細情報について
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- CRID
- 1390282679300625536
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- NII論文ID
- 130004833212
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BD1cXosVKrtL0%3D
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 9549094
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDLサーチ
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