Suppression of Pattern Edge Roughness by Low Ion Strength Developer.

  • Kumada Teruhiko
    Super-fine SR lithography Laboratory, Association of Super-advanced Electronics Technologies (ABET)
  • Sumitani Hiroaki
    Super-fine SR lithography Laboratory, Association of Super-advanced Electronics Technologies (ABET)
  • Matsui Yasuji
    Super-fine SR lithography Laboratory, Association of Super-advanced Electronics Technologies (ABET)

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