Numerical Investigations on Requirements for BARK Materials for Hyper NA Immersion Lithography
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- Matsuzawa Nobuyuki
- Lithography Technology Department, Process Development Division, Semiconductor Technology Development Group, Semiconductor Network Solutions Company, SONY Corporation
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- Watanabe Yoko
- Lithography Technology Department, Process Development Division, Semiconductor Technology Development Group, Semiconductor Network Solutions Company, SONY Corporation
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- Thuunakart Boontarika
- Lithography Technology Department, Process Development Division, Semiconductor Technology Development Group, Semiconductor Network Solutions Company, SONY Corporation
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- Ozawa Ken
- Lithography Technology Department, Process Development Division, Semiconductor Technology Development Group, Semiconductor Network Solutions Company, SONY Corporation
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- Yamaguchi Yuko
- Lithography Technology Department, Process Development Division, Semiconductor Technology Development Group, Semiconductor Network Solutions Company, SONY Corporation
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- Ikeda Rikio
- Lithography Technology Department, Process Development Division, Semiconductor Technology Development Group, Semiconductor Network Solutions Company, SONY Corporation
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- Kawahira Hiroichi
- Lithography Technology Department, Process Development Division, Semiconductor Technology Development Group, Semiconductor Network Solutions Company, SONY Corporation
書誌事項
- タイトル別名
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- Numerical Investigations on Requirements for BARC Materials for Hyper NA Immersion Lithography
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Requirement on substrate reflectance was estimated numerically based on an optical simulation for hyper-NA (numerical aperture) lithography with the water immersion technique. Conditions to minimize the substrate reflectance were further calculated for dual BARC (bottom antireflective coating) layers with NA varying from 1.0 to 1.4. In addition, margins of the conditions were estimated based on the requirements on substrate reflectance. Based on these numerical results, requirements for materials to be used for dual BARC layers are discussed.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 18 (5), 587-592, 2005
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詳細情報 詳細情報について
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- CRID
- 1390282679301909120
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- NII論文ID
- 130004833057
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BD2MXmtVOqtrs%3D
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 7338185
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可