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- Neisser Mark
- SEMATECH
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- Jen Shih-Hui
- SEMATECH
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- Chun Jun Sung
- SEMATECH
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- Antohe Alin
- SEMATECH
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- He Long
- SEMATECH
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- Kearney Patrick
- SEMATECH
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- Goodwin Frank
- SEMATECH
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抄録
EUV lithography is needed by the semiconductor industry for both its resolution and for the process simplification it provides compared to multiple patterning. However it needs many innovations to make it a success and is an expensive technology to develop. Major areas of concern are source power, defect free mask availability, defect freedom during use and resist performance. Long term it will also need improved mask and material technology for higher NA EUV imaging. SEMATECH is working on mask technology, defects and resist technology for EUV imaging and has developed new mask inspection technology, novel approaches to EUV resist, lower defectivity mask blanks and improved cleaning methods. SEMATECH’s work enables the semiconductor industry to share the cost of developing EUV technology and accelerates the progress of EUV.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 27 (5), 595-600, 2014
フォトポリマー学会
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詳細情報 詳細情報について
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- CRID
- 1390282679302456832
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- NII論文ID
- 130004691090
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- NII書誌ID
- AA11576862
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 025604077
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可