ＣＶＤ材料プロセス　　Ｏ２プラズマにおけるＯラジカルの役割

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  • 松井 功
    (株) 東芝研究開発センター 機械システムラボラトリー

書誌事項

タイトル別名
  • CVD Material Processing. A Role of O Radical on the Formation of O2 Gas Plasma.
  • O2 プラズマ ニ オケル Oラジカル ノ ヤクワリ

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説明

The effect of plasma formed gas on the plasma structure is investigated using a self consistent continuous fluid plasma model, which assumes that the local field approximation was attained in the RF plasma. The swarm parameter was obtained by Boltzmann analysis for O2 gas which contains various amounts of O radicals. Positive ion density, negative ion density, and electron density in the O2 RF plasma including O radical generation were calculated by self-consistent one dimensional continuous fluid plasma model. The calculation results show the dominant positive charged particle became O+ from O2+ with increasing amount of O radical in O2. The plasma positive densities are not greatly affected if O radical content did not exceed 1% of O2. It was concluded that O2 plasma structure can be evaluated by source gas plasma calculation neglecting radical formation, since O radical formation in the O2 plasma is estimated as less than 0.2% of O2.

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