High-Density Radio-Frequency Plasma Sources Produced by Capacitive Discharge with Various Methods for Thin-Film Preparation

DOI Web Site Web Site 参考文献23件
  • Ohtsu Yasunori
    Department of Electrical and Electronic Engineering, Graduate School of Science and Engineering, Saga University

この論文をさがす

抄録

Radio-frequency plasma produced by capacitive discharge has been widely used for microelectronic industry because it has a simple structure in its device and its easy maintenance. However, it has disadvantage such as a low plasma-density with the magnitude of 108-109 cm-3. In the paper, high-density radio-frequency capacitive-discharge plasma sources with various methods have been reviewed for thin-film preparation. These methods are the segmented electrode under high driving frequency, the high-secondary-electron-emission-electrode and the various hollow cathode electrodes. In this review, these solutions are assessed and discussed.

収録刊行物

参考文献 (23)*注記

もっと見る

キーワード

詳細情報 詳細情報について

問題の指摘

ページトップへ