High-Density Radio-Frequency Plasma Sources Produced by Capacitive Discharge with Various Methods for Thin-Film Preparation

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  • Ohtsu Yasunori
    Department of Electrical and Electronic Engineering, Graduate School of Science and Engineering, Saga University

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Abstract

Radio-frequency plasma produced by capacitive discharge has been widely used for microelectronic industry because it has a simple structure in its device and its easy maintenance. However, it has disadvantage such as a low plasma-density with the magnitude of 108-109 cm-3. In the paper, high-density radio-frequency capacitive-discharge plasma sources with various methods have been reviewed for thin-film preparation. These methods are the segmented electrode under high driving frequency, the high-secondary-electron-emission-electrode and the various hollow cathode electrodes. In this review, these solutions are assessed and discussed.

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