書誌事項
- タイトル別名
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- Detection of Defects in EUVL Mask using Coherent EUV Source
- コヒーレント EUV コウゲン オ モチイタ EUVL マスク ノ ケッカン ケンシュツ
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抄録
The detection and evaluation of printable defects in extreme ultraviolet lithography (EUV) masks are one of the most critical issues for high-volume manufacturing of next generation semiconductor. The coherent EUV scatterometry microscope is a strong candidate for high-precision inspection of defects. We have developed the high-order harmonics generation system to generate coherent EUV light using the commercial table-top laser system. The low beam divergence was measured to be 0.18mrad for 13.5nm (59th) high-order harmonics. The spatially coherent, 59th harmonics was improved the contrast ratio of diffraction images. Defect signals were observed from the 2-nm width line-defect in the 88-nm line-and-space (L/S) pattern and the 54-nm defect in the 360nm pitch pattern using coherent scatterometry microscope equipped with high-order harmonics generation system as a practical coherent EUV light source.
収録刊行物
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- 電気学会論文誌. A
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電気学会論文誌. A 133 (10), 509-518, 2013
一般社団法人 電気学会
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詳細情報 詳細情報について
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- CRID
- 1390282679576979200
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- NII論文ID
- 10031200957
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- NII書誌ID
- AN10136312
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- ISSN
- 13475533
- 03854205
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- NDL書誌ID
- 024946393
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
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- 抄録ライセンスフラグ
- 使用不可