書誌事項
- タイトル別名
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- Evaluation of Thin Films Prepared by r.f. Sputtering with a Poly(etheretherketone) Target
- Poly etheretherketone PEEK オ ターゲット ト シタ コウシュウハ スパッタリングホウ ニ ヨル ハクマク サクセイ ト ソノ ヒョウカ
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抄録
Thin films were sputtered by an r.f. sputtering with a poly(etheretherketone) (PEEK) target at four different sputtering conditions e.g., 150 Watt (W)-0.6 Pascal (Pa), 25 W-0.6 Pa, 150 W-3.0 Pa and 25 W-3.0 Pa. Visible light transmissions of these sputtered thin films were measured with spectrophotometer. Elemental compositions and chemical bonding states of these sputtered thin films were analyzed with x-rays photoelectron spectroscopy (XPS) and fourier transform infrared spectroscopy (FT-IR). Surface morphologies of these sputtered thin films were observed with atomic force microscope (AFM). Molecular structures and elemental compositions of these sputtered thin films prepared with the r.f. sputtering were quite different from pristine PEEK. Oxygen contents of these thin films decreased compared to that of the pristine PEEK. Pressures during the sputtering give large effects on the molecular structure, elemental compositions and surface morphologies of these thin films.<br>
収録刊行物
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- Ｊｏｕｒｎａｌ ｏｆ ｔｈｅ Ｖａｃｕｕｍ Ｓｏｃｉｅｔｙ ｏｆ Ｊａｐａｎ
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Ｊｏｕｒｎａｌ ｏｆ ｔｈｅ Ｖａｃｕｕｍ Ｓｏｃｉｅｔｙ ｏｆ Ｊａｐａｎ 53 (7), 458-462, 2010
一般社団法人 日本真空学会
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詳細情報 詳細情報について
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- CRID
- 1390282680272485120
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- NII論文ID
- 10026525796
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- NII書誌ID
- AA12298652
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- ISSN
- 18824749
- 18822398
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- NDL書誌ID
- 10785958
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可