書誌事項
- タイトル別名
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- Tensile Strength of Poly-Si Film for Membrane of MEMS Microphone
抄録
<p>This paper reports a quasi-static tensile test on the polysilicon thin film served as a diaphragm in MEMS microphone. The polysilicon tensile thin film samples have dimensions of 100 μm long, 10 μm wide and 0.78 or 1 μm thick and deposited using low pressure chemical vapor deposition (LPCVD) method, which is completely same as the microphone fabrication. The average tensile strength of polysilicon was around 2.3 GPa~3.8 GPa. A good agreement was observed between the tensile strength and compressive air test.</p>
収録刊行物
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- 年次大会
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年次大会 2018 (0), J2230102-, 2018
一般社団法人 日本機械学会
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詳細情報 詳細情報について
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- CRID
- 1390282763115889792
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- NII論文ID
- 130007619837
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- ISSN
- 24242667
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可