Preparation of Ta2O5 solid electrolyte thin film by a combination sputtering method with radio-frequency oxygen plasma irradiation
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- Hiroshi TANEDA
- Miyakonojo National College of Techonology(Present:NIST)
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- Yukie HIGASHIMARU
- Miyakonojo National College of Techonology(Present:NIST)
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- Fumihiro SEI
- HONDA Lock Mfg.Co.,Ltd
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- Yoshiko KAWANO
- HONDA Lock Mfg.Co.,Ltd
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- Daisuke NOGUCHI
- Miyakonojo National College of Techonology
Bibliographic Information
- Other Title
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- RF酸素プラズマ照射を特長とした併用式スパッタ法によるTa2O5固体電解質薄膜の作製
- RF サンソ プラズマ ショウシャ オ トクチョウ ト シタ ヘイヨウシキ スパッタホウ ニ ヨル Ta ₂ O ₅ コタイ デンカイシツ ハクマク ノ サクセイ
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Journal
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- Research Report of Miyakonojo National College of Technology
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Research Report of Miyakonojo National College of Technology 46 (0), 23-32, 2012
National Institute of Technology, Miyakonojo College
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Details 詳細情報について
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- CRID
- 1390283659866262272
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- NII Article ID
- 110008895946
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- NII Book ID
- AN00235996
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- ISSN
- 0286116X
- 24321036
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- NDL BIB ID
- 023557475
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- CiNii Articles