プラズマが誘起する表面反応の制御による膜作製

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タイトル別名
  • Film Deposition by Controlling Plasma-induced Surface Reactions

抄録

<p>A lot of kinds of reactive chemical species generated in plasma contribute to the film deposition, so that the films can be deposited at low temperatures and many types of films can be deposited. Controlling Plasma-induces Surface Reactions will be the key of the future film deposition, as well as the control of plasma. State-of-art studies in this field will be introduced.</p>

収録刊行物

  • 表面と真空

    表面と真空 67 (2), 42-43, 2024-02-10

    公益社団法人 日本表面真空学会

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