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Clarification of Polishing Mechanism Focusing on Abrasive Particle Behavior in CMP
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- HAYASHI Syuntaro
- Kyushu University
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- KUROKAWA Syuhei
- Kyushu University
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- HAYASHI Terutake
- Kyushu University
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- HIYAMA Hirokuni
- EBARA CORPORATION
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- WADA Yutaka
- EBARA CORPORATION
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- HANDA Naoyuki
- EBARA CORPORATION
Bibliographic Information
- Other Title
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- CMPにおける砥粒挙動に着目した研磨機構の解明
- －研磨レートの異なるパッドの負荷曲線の調査と研磨モデルの提案－
- -Investigation of the Abbott Firestone curve of pads with different polishing rates and proposal of a polishing model-
Journal
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- The Proceedings of Conference of Kyushu Branch
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The Proceedings of Conference of Kyushu Branch 2022.75 (0), H17-, 2022
The Japan Society of Mechanical Engineers
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Details 詳細情報について
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- CRID
- 1390585803080259456
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- ISSN
- 24242780
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- Text Lang
- ja
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- Data Source
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- JaLC