Resolution, line-edge roughness, sensitivity tradeoff, and quantum yield of high photo acid generator resists for extreme ultraviolet lithography
書誌事項
- タイトル別名
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- Resolution line edge roughness sensitivity tradeoff and quantum yield of high photo acid generator resists for extreme ultraviolet lithography
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収録刊行物
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- Japanese journal of applied physics : JJAP
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Japanese journal of applied physics : JJAP 50 (3), 036504-, 2011-03
Tokyo : The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1520290883298492928
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- NII論文ID
- 40018777933
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- NII書誌ID
- AA12295836
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- ISSN
- 00214922
- 13474065
- http://id.crossref.org/issn/13474065
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- NDL書誌ID
- 11054662
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- 本文言語コード
- en
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- NDL 雑誌分類
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- ZM35(科学技術--物理学)
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- データソース種別
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- NDL
- Crossref
- CiNii Articles