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Synergy effect of particle radiation and ultraviolet radiation from capacitively coupled radio frequency argon plasmas on n-GaN etching damage
Bibliographic Information
- Other Title
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- Synergy effect of particle radiation and ultraviolet radiation from capacitively coupled radio frequency argon plasmas on n GaN etching damage
- Special issue: Dry process
- Special issue Dry process
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Description
資料形態 : テキストデータ プレーンテキスト
コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌
Journal
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- Japanese journal of applied physics : JJAP
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Japanese journal of applied physics : JJAP 47 (8), 6863-6866, 2008-08
Tokyo : The Japan Society of Applied Physics