SOR Lithography : Lithography Technology :

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Description

An SOR facility has been built at the NTT LSI laboratories, and includes an injector linac, a normalconducting accelerating ring (NAR) and a superconducting compact storage ring (Super-ALIS) fully dedicated to X-ray lithography, A 45 mA electron beam has been stored at 600 MeV in Super-ALIS with a low-energy-one-pulse-injection scheme. The beam line, the stepper and X-ray masks have been studied and evaluated through experimental device fabrication. This paper overviews the present status of SOR lithography technologies at the NTT LSI laboratories.

Journal

  • JJAP series

    JJAP series 3 72-75, 1989-12-30

    Japanese Journal of Applied Physics

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