Effect of Surface Treatments after HF Etching on Oxidation of Si
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- EGAWA M.
- Faculty of Science and Technology, Science University of Tokyo
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- IKOMA Hideaki
- Faculty of Science and Technology, Science University of Tokyo
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Journal
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- Jpn. J. Appl. Phys.
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Jpn. J. Appl. Phys. 33 943-, 1994
The Japan Society of Applied Physics
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Keywords
Details 詳細情報について
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- CRID
- 1570009752456022016
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- NII Article ID
- 110003902954
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- NII Book ID
- AA10457675
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- Text Lang
- en
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- Data Source
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- CiNii Articles