Effect of Surface Treatments after HF Etching on Oxidation of Si

  • EGAWA M.
    Faculty of Science and Technology, Science University of Tokyo
  • IKOMA Hideaki
    Faculty of Science and Technology, Science University of Tokyo

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Details 詳細情報について

  • CRID
    1570009752456022016
  • NII Article ID
    110003902954
  • NII Book ID
    AA10457675
  • Text Lang
    en
  • Data Source
    • CiNii Articles

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